Preparation of Novel Sulfur-Containing Ligands for Permanently Porous Materials
Additional Funding Sources
The project described was supported by an Institutional Development Award (IDeA) from the National Institute of General Medical Sciences of the National Institutes of Health under Grant Nos. P20GM103408 and P20GM109095, the National Science Foundation S-STEM Gateway Scholarships in Biological Sciences under Grant Award No. DUE-1644233 to Boise State University and the College of Arts and Sciences. We also acknowledge support from the Biomolecular Research Center at Boise State with funding from the National Science Foundation, Grant Nos. 0619793 and 0923535, the M.J. Murdock Charitable Trust, and the Idaho State Board of Education. Additional support is provided by the American Chemical Society Project SEED Program, ISU Career Path Internship Program, National Science Foundation S-STEM (CHE-1458292), ISU Strategic Initiatives Undergraduate funding under No. AHR44.
Abstract
Permanently Porous Materials are generally synthesized from di- and tri-topic organic molecules containing Carboxylic acid functional groups. Sulfur-containing analogs of carboxylic acid molecules can be used to create permanently porous materials with novel properties. Thiocarboxylate and thiocarbamate molecules are synthesized and used as the ligands for the formation of permanently porous materials. The analouge materials are then compared for novel properties and possible applications.
Preparation of Novel Sulfur-Containing Ligands for Permanently Porous Materials
Permanently Porous Materials are generally synthesized from di- and tri-topic organic molecules containing Carboxylic acid functional groups. Sulfur-containing analogs of carboxylic acid molecules can be used to create permanently porous materials with novel properties. Thiocarboxylate and thiocarbamate molecules are synthesized and used as the ligands for the formation of permanently porous materials. The analouge materials are then compared for novel properties and possible applications.