Publication Date
5-2011
Type of Culminating Activity
Thesis
Degree Title
Master of Science in Electrical Engineering
Department
Electrical and Computer Engineering
Supervisory Committee Chair
Kristy A. Campbell, Ph.D.
Abstract
In this work, ion-conducting devices using layers of chalcogenide materials are explored as potential non-volatile memory devices. This technology is also known in the literature as conductively bridged RAM (CBRAM), programmable metallization cell (PMC), and programmable conductor RAM (PCRAM; not to be confused with the acronym PCRAM as used to denote phase-change memory).
Electrical measurements with five different programming currents at four temperatures have been performed on two-terminal devices comprised of silver with a metal-selenide and germanium-chalcogenide layer. The metal-selenide layer is Sb2Se3, SnSe, PbSe, In2Se3, or Ag2Se. The germanium-chalcogenide layer is either Ge2Se3 or GeTe. Total ionizing dose radiation effects are also investigated for GeTe/SnSe/Ag and Ge2Se3/SnSe/Ag devices.
Recommended Citation
Cook, Beth Rose, "Electrical Switching Studies of Chalcogenide-Based Ion-Conducting Variable Resistance Devices" (2011). Boise State University Theses and Dissertations. 193.
https://scholarworks.boisestate.edu/td/193