Properties of Sputter-Deposited Ni–Mn–Ga Thin Films

Authors

Volodymyr A. Chernenko, Institute of Magnetism
Stefano Besseghini, CNR-IENI
Michael Hagler, Boise State UniversityFollow
Peter Müllner, Boise State UniversityFollow
Makoto Ohtsuka, Tohoku University
F. Stortiero, CNR-IENI

Document Type

Article

Publication Date

5-25-2008

Abstract

Sub-micrometer Ni–Mn–Ga films on MgO(0 0 1) single-crystalline wafers have been prepared by radio-frequency magnetron sputtering. The structural and magnetic states of the as-received (quasi-amorphous phase) and annealed (highly ordered martensitic phase at T = 300 K) films have been examined by X-ray diffraction, and measurements of resistivity and magnetization. The annealed films demonstrate a transformation behavior typical for the bulk and show a thickness dependence of the magnetic properties.

Publication Information

Chernenko, Volodymyr A.; Besseghini, Stefano; Hagler, Michael; Müllner, Peter; Ohtsuka, Makoto; and Stortiero, F.. (2008). "Properties of Sputter-Deposited Ni–Mn–Ga Thin Films". Materials Science and Engineering: A, 481-482271-274. https://doi.org/10.1016/j.msea.2006.12.206