The Uses of Plasma Methods for Novel Advanced Manufacturing Feedstock Development
Faculty Mentor Information
Dr. Rene Rodriguez (Mentor), Idaho State University
Abstract
Advanced manufacturing feedstock development methods are largely innovative and increasing in efficiency. Recent studies are being done to construct materials that can be more resistant to exposure in extreme environments such as those present in nuclear reactors. A large portion of these studies are constructed using wet chemistry approaches, but plasma sputtering is seen as a novel approach. This method involves gas-phase plasma synthesis that could avoid drawbacks from wet chemical methods. To explore the potentially promising new route, we are utilizing the magnetron sputtering system at Idaho State University in the Chemistry Dept. Here, a thin film is developed by bombarding a target material to land on a substrate. Future targets will be constructed in collaboration with the Center for Advanced Energy Studies using their cryomill and to date have been made out of various combinations of silver, indium, tin, or zinc–all novel materials in the field. Analysis of the composition of the films are completed at ISU with the use of Raman spectroscopy and X-ray diffraction, and their morphology and atomic composition through SEM and EDS techniques. This project is an introduction to the possibilities plasma sputtering unlocks in manufacturing advanced materials and could be used to support larger research efforts in the future.
The Uses of Plasma Methods for Novel Advanced Manufacturing Feedstock Development
Advanced manufacturing feedstock development methods are largely innovative and increasing in efficiency. Recent studies are being done to construct materials that can be more resistant to exposure in extreme environments such as those present in nuclear reactors. A large portion of these studies are constructed using wet chemistry approaches, but plasma sputtering is seen as a novel approach. This method involves gas-phase plasma synthesis that could avoid drawbacks from wet chemical methods. To explore the potentially promising new route, we are utilizing the magnetron sputtering system at Idaho State University in the Chemistry Dept. Here, a thin film is developed by bombarding a target material to land on a substrate. Future targets will be constructed in collaboration with the Center for Advanced Energy Studies using their cryomill and to date have been made out of various combinations of silver, indium, tin, or zinc–all novel materials in the field. Analysis of the composition of the films are completed at ISU with the use of Raman spectroscopy and X-ray diffraction, and their morphology and atomic composition through SEM and EDS techniques. This project is an introduction to the possibilities plasma sputtering unlocks in manufacturing advanced materials and could be used to support larger research efforts in the future.