ALD (Atomic layer deposition) Process Monitoring with FTIR Spectroscopy

Additional Funding Sources

This project is supported by the American Chemical Society Project SEED Program.

Presentation Date

7-2022

Abstract

In this project, our primary objective is to design, fabricate, and test an interface between a Fourier transform infrared spectrometer (FTIR) and an atomic layer deposition (ALD) reactor in order to provide for real-time monitoring of the ALD process with infrared spectroscopy.

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ALD (Atomic layer deposition) Process Monitoring with FTIR Spectroscopy

In this project, our primary objective is to design, fabricate, and test an interface between a Fourier transform infrared spectrometer (FTIR) and an atomic layer deposition (ALD) reactor in order to provide for real-time monitoring of the ALD process with infrared spectroscopy.