ALD (Atomic layer deposition) Process Monitoring with FTIR Spectroscopy

Additional Funding Sources

This project is supported by the American Chemical Society Project SEED Program.

Abstract

In this project, our primary objective is to design, fabricate, and test an interface between a Fourier transform infrared spectrometer (FTIR) and an atomic layer deposition (ALD) reactor in order to provide for real-time monitoring of the ALD process with infrared spectroscopy.

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ALD (Atomic layer deposition) Process Monitoring with FTIR Spectroscopy

In this project, our primary objective is to design, fabricate, and test an interface between a Fourier transform infrared spectrometer (FTIR) and an atomic layer deposition (ALD) reactor in order to provide for real-time monitoring of the ALD process with infrared spectroscopy.