Abstract Title

Controlled Dosing of Molecular Vapors into Ultra-High Vacuum

Additional Funding Sources

This project is supported by the American Chemical Society Project SEED Program.

Abstract

In order to study the behavior of surface-bound molecules used in atomic layer deposition, it is necessary to be able to deliver finely controlled doses of chemical precursor vapors into an ultra-high vacuum (UHV) system containing a pristine sample surface. To enable controlled precursor dosing, an ballast chamber was constructed. The ballast chamber is capable of holding a precursor vapor at a specific pressure combined with a computer controlled valve that allows dosing of a fixed amount of gas into the UHV chamber. Here, the design and construction of the ballast chamber is discussed.

This document is currently not available here.

Share

COinS
 

Controlled Dosing of Molecular Vapors into Ultra-High Vacuum

In order to study the behavior of surface-bound molecules used in atomic layer deposition, it is necessary to be able to deliver finely controlled doses of chemical precursor vapors into an ultra-high vacuum (UHV) system containing a pristine sample surface. To enable controlled precursor dosing, an ballast chamber was constructed. The ballast chamber is capable of holding a precursor vapor at a specific pressure combined with a computer controlled valve that allows dosing of a fixed amount of gas into the UHV chamber. Here, the design and construction of the ballast chamber is discussed.