Process Development of Electron Beam Lithography in an Academic Environment

Authors

Gregory S. Gatlin, Boise State University
Cory W. Eskridge, Boise State University
Jacob M. Brinkerhoff, Boise State University
Jared D. Fife, Boise State University
Jeffrey R. Jessing, Boise State University

Document Type

Article

Publication Date

1-1-2004

DOI

http://dx.doi.org/10.1109/WMED.2004.1297370

Abstract

This paper compares the processes of photolithography and electron beam lithography (EBL). In addition, we discuss the procedure used to implement EBL in a university laboratory, specifically Boise State University’s (BSU) Idaho Microfabrication Laboratory (IML).

Publication Information

Gatlin, Gregory S.; Eskridge, Cory W.; Brinkerhoff, Jacob M.; Fife, Jared D.; and Jessing, Jeffrey R.. (2004). "Process Development of Electron Beam Lithography in an Academic Environment". IEEE Workshop on Microelectronics and Electron Devices, 117-119.