Understanding the Effects of Plasma Parameters on Plasma-Jet Printed Material Films

Document Type

Student Presentation

Presentation Date



College of Engineering


Department of Electrical & Computer Engineering

Faculty Sponsor

Dr. Harish Subbaraman


The demand for consistent additive manufacturing processes for biosensors that make use of flexible substrates is increasingly desired. Recent work has demonstrated a strong candidate for such processing is a plasma jet printing process. Optimization of the plasma jet printing process requires investigating the effects of different plasma conditions and flow rates, nanomaterial inks, and substrates on print quality and material properties. In this work, we examine the effects of using argon and nitrogen plasma sources on the conductivity and adhesion of four-point structures printed on polyamide substrates. The plasma source is a parallel plate discharge with a 0.5-1mm gap using two embedded metal electrodes. The source operates at 20 kHz and 2-3.5 kV. A new plasma source enclosure and mounting fixtures have been combined with an XY stage to print the inks. Print quality is verified through imaging the samples via scanning electron microscopy and examining the atomic spectra. Our future work involves the characterization of other nanoparticle inks and further demonstrating plasma jet printing as a cost effective, time efficient, and viable process. These results will be presented.


*This research is supported by a seed grant from the NASA Idaho Space Grant Consortium (ISGC).

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