Streamlining Semiconductor Steps with Spin Coating
Faculty Mentor Information
Dr. Elton Graugnard, Boise State University; Nolan Olaso, Boise State University; and Dr. Corey Efaw, Boise State University
Presentation Date
7-16-2026
Abstract
Semiconductor manufacturers are constantly working to reduce the steps required in their chip making process to conserve time, money, and resources. Small molecule inhibitors (SMI) can negate the need for some lithography steps in the manufacturing process by inhibiting atomic layer deposition (ALD) growth on certain substrates. Here, a spin-coating method of applying these SMI’s is investigated using PMMA as a model. PMMA has been selected to model SMI’s because both substances are dissolved in a solvent and must be baked to cure. Ellipsometry is used to observe uniformity in the PMMA film thickness. Photothermal atomic force microscopy-infrared spectroscopy (AFM-IR) is used to observe defects in films and their composition. A repeatable, uniform and defect-free PMMA spin-coat would suggest that spin-coating is an effective method for applying SMI films to substrates. Uniform coats were produced, and future action will involve testing the effectiveness of spin-coated SMI’s in inhibiting ALD growth.
Streamlining Semiconductor Steps with Spin Coating
Semiconductor manufacturers are constantly working to reduce the steps required in their chip making process to conserve time, money, and resources. Small molecule inhibitors (SMI) can negate the need for some lithography steps in the manufacturing process by inhibiting atomic layer deposition (ALD) growth on certain substrates. Here, a spin-coating method of applying these SMI’s is investigated using PMMA as a model. PMMA has been selected to model SMI’s because both substances are dissolved in a solvent and must be baked to cure. Ellipsometry is used to observe uniformity in the PMMA film thickness. Photothermal atomic force microscopy-infrared spectroscopy (AFM-IR) is used to observe defects in films and their composition. A repeatable, uniform and defect-free PMMA spin-coat would suggest that spin-coating is an effective method for applying SMI films to substrates. Uniform coats were produced, and future action will involve testing the effectiveness of spin-coated SMI’s in inhibiting ALD growth.