Radio frequency sputter deposition of germanium sulfide thin films can be optimized for surface thickness homogeneity and surface roughness. Optimizing these two components are the first steps of producing memory devices that use the film as a solid electrolyte. The best films were produced using a sputter power of 16 Watts and a pressure of 0.2 mbar. Using these settings a deposition rate of 3.7 nm/min was recorded and the films had a minimum RMS surface roughness of 0.4550 nm.
Dr. Maria Mitkova