Process Development of Electron Beam Lithography in an Academic Environment
This paper compares the processes of photolithography and electron beam lithography (EBL). In addition, we discuss the procedure used to implement EBL in a university laboratory, specifically Boise State University’s (BSU) Idaho Microfabrication Laboratory (IML).
Gatlin, Gregory S.; Eskridge, Cory W.; Brinkerhoff, Jacob M.; Fife, Jared D.; and Jessing, Jeffrey R.. (2004). "Process Development of Electron Beam Lithography in an Academic Environment". IEEE Workshop on Microelectronics and Electron Devices, 117-119. http://dx.doi.org/10.1109/WMED.2004.1297370