Title

Process Development of Electron Beam Lithography in an Academic Environment

Document Type

Article

Publication Date

1-1-2004

DOI

http://dx.doi.org/10.1109/WMED.2004.1297370

Abstract

This paper compares the processes of photolithography and electron beam lithography (EBL). In addition, we discuss the procedure used to implement EBL in a university laboratory, specifically Boise State University’s (BSU) Idaho Microfabrication Laboratory (IML).

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