Publication Date
5-2011
Type of Culminating Activity
Thesis
Degree Title
Master of Science in Electrical Engineering
Department
Electrical and Computer Engineering
Major Advisor
Kristy A. Campbell, Ph.D.
Abstract
In this work, ion-conducting devices using layers of chalcogenide materials are explored as potential non-volatile memory devices. This technology is also known in the literature as conductively bridged RAM (CBRAM), programmable metallization cell (PMC), and programmable conductor RAM (PCRAM; not to be confused with the acronym PCRAM as used to denote phase-change memory).
Electrical measurements with five different programming currents at four temperatures have been performed on two-terminal devices comprised of silver with a metal-selenide and germanium-chalcogenide layer. The metal-selenide layer is Sb2Se3, SnSe, PbSe, In2Se3, or Ag2Se. The germanium-chalcogenide layer is either Ge2Se3 or GeTe. Total ionizing dose radiation effects are also investigated for GeTe/SnSe/Ag and Ge2Se3/SnSe/Ag devices.
Recommended Citation
Cook, Beth Rose, "Electrical Switching Studies of Chalcogenide-Based Ion-Conducting Variable Resistance Devices" (2011). Boise State University Theses and Dissertations. 193.
https://scholarworks.boisestate.edu/td/193