Abstract Title

Polyoxometalate Cores In Hybrid Nano-Building Blocks for Extreme Ultra Violet Photoresists

Disciplines

Polymer and Organic Materials | Semiconductor and Optical Materials

Abstract

Extreme Ultra Violet (EUV) lithography is a developing semiconductor fabrication technology of great potential. The Semiconductor Research Corporation is supporting an investigation of polymer-based chemically amplified photoresists which have historically been used with great success but are limited in the EUV range.

Polyoxometalate Nano-Building Blocks offer the potential to serve as non-chemically amplified photoresists with higher resolution, favorable EUV absorption, and negligible off-gassing.These polyoxometalates combine organic functionality, which lets multiple polymerizeable groups be added to the molecule allowing for adjustable cross linkage, and inorganic functionality, offering variations in electron density and etch resistance.

Quaternary ammonium isopolyoxometalates and variations of hexamolybdate structures of this type have been successfully synthesized and confirmed in this project and is now focused on the unknown tetrahexyl-, tetraheptyl- and tetraoctyl-ammonium derivatives and the changes in the reactivity of the inorganic core. Discussion will include challenges faced, unique discoveries and future exploration of an electron-dense hexatungstate core.

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Polyoxometalate Cores In Hybrid Nano-Building Blocks for Extreme Ultra Violet Photoresists

Extreme Ultra Violet (EUV) lithography is a developing semiconductor fabrication technology of great potential. The Semiconductor Research Corporation is supporting an investigation of polymer-based chemically amplified photoresists which have historically been used with great success but are limited in the EUV range.

Polyoxometalate Nano-Building Blocks offer the potential to serve as non-chemically amplified photoresists with higher resolution, favorable EUV absorption, and negligible off-gassing.These polyoxometalates combine organic functionality, which lets multiple polymerizeable groups be added to the molecule allowing for adjustable cross linkage, and inorganic functionality, offering variations in electron density and etch resistance.

Quaternary ammonium isopolyoxometalates and variations of hexamolybdate structures of this type have been successfully synthesized and confirmed in this project and is now focused on the unknown tetrahexyl-, tetraheptyl- and tetraoctyl-ammonium derivatives and the changes in the reactivity of the inorganic core. Discussion will include challenges faced, unique discoveries and future exploration of an electron-dense hexatungstate core.